Plasma Modeling:Simulating Inductively Coupled Plasma (ICP) | samadii/plasma

📱⚛Inductively Coupled Plasma (ICP) is a high-temperature ionization technique used in analytical chemistry and various industrial processes. It involves creating a high-temperature plasma by applying radiofrequency (RF) energy to a gas, typically argon. 📱In the context of semiconductor processing, dry etching is a method used to selectively remove material from a substrate to create patterns or features.ICP is known for its high temperature, stability, and uniformity, making it suitable for various analytical and industrial applications. ✍🏻ICP is applied in a wide range of fields, including environmental analysis, semiconductors, pharmaceuticals, metallurgy, and more. 👍🏻Its high sensitivity and ability to analyze a broad spectrum of elements make it a versatile tool for elemental analysis. 🚩Simulation tools like samadii/plasma module can be employed to solve these types of problems. 👀 This is a simulation made using #samadii/plasma Get in touch with us to learn more▶ support@metariver.kr #ICP #InductivelyCoupledPlasma #plasmatechnology #samadii #gpu #simulation #plasmasimulation #semiconductor #thinfilms #plasma #simulationsoftware #thinfilm #semiconductorindustry #metariver #semiconductors #display #semiconductormanufacturing #displays #photonics #optics #plasmasimulation #PVD #PECVD #antennas #coatings #wafer #wafers #ions #substrate #쿠다 #반도체 #플라즈마 #메타리버테크놀러지 #시뮬레이션 #사마디