๐ฑโPlasma sputtering, also known as magnetron sputtering or physical vapor deposition (PVD), is a thin-film deposition technique used to coat surfaces with a layer of material.
๐ข Plasma sputtering is widely used in various industries, including semiconductor manufacturing, optics, and electronics, due to its ability to create high-quality thin films with excellent adhesion to substrates. It offers advantages such as uniform film deposition, good control over film thickness, and the ability to deposit a wide range of materials.
๐ฉIf you have a specific issue or question related to plasma simulation, contact us at support@metariver.kr we can provide more assistance.
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